| Proj No. | A2034-251 |
| Title | Design and fabrication of passive photonics for photonic integrated circuits |
| Summary | This project aims to create a passive silicon (Si) photonic components, a crucial functions in photonic integrated circuits (PICs) that enables the manipulation and guidance of light signals for various applications including optical interconnects, sensors, and optical communication systems. The project is divided into two phases. The first phase will focus on designing the Si photonic waveguide using software tools like Comsol and Lumerical FDTD. The design process will consider the waveguide dimensions, material properties, and operating wavelength, and simulation software will optimize the design parameters and assess the waveguide's performance, such as dispersion, mode confinement, and propagation loss. In the second phase, the Si photonic waveguide will be fabricated using standard CMOS processing, starting with Si deposition on a silicon dioxide substrate, followed by waveguide patterning using a lithographic mask, and then waveguide etching using reactive ion etching (RIE) to achieve the desired shape and dimensions. Finally, the waveguide's performance will be evaluated using various characterization techniques like optical microscopy, scanning electron microscopy (SEM), and optical spectroscopy. The ultimate goal is to produce a high-performing Si photonics that can be utilized in PICs and contribute to the development of new and improved photonic technologies. |
| Supervisor | Ast/P Chae Sanghoon (Loc:S2 > S2 B2B > S2 B2B 64, Ext: +65 67905393) |
| Co-Supervisor | - |
| RI Co-Supervisor | - |
| Lab | Nanophotonics Laboratory (formerly Engineering Materials) (Loc: S1-B2a-02) |
| Single/Group: | Single |
| Area: | Microelectronics and Biomedical Electronics |
| ISP/RI/SMP/SCP?: |