| Proj No. | A2265-251 |
| Title | Simulation and characterization of a hollow cathode plasma source for thin film growth |
| Summary | Plasmas play a significant role in thin film coating techniques, aiding in both film growth and densification. The hollow cathode plasma source, utilized in hollow cathode-activated deposition, combines a high-rate evaporation process with high-density plasma activation through hollow cathode arc discharge. In this project, the student will engage in optimizing and characterizing a newly developed hollow cathode plasma source using COMSOL simulation and plasma diagnostics. No prior knowledge of simulation and plasma diagnostics is needed. |
| Supervisor | Prof Tay Beng Kang (Loc:S1 > S1 B1A > S1 B1A 29, Ext: +65 67904533) |
| Co-Supervisor | - |
| RI Co-Supervisor | - |
| Lab | Nanoelectronics Lab. I (Loc: S1-B3a-01) |
| Single/Group: | Single |
| Area: | Microelectronics and Biomedical Electronics |
| ISP/RI/SMP/SCP?: |